"㈜인포비온"은

인류의 미래를 새롭게 창조해 나아갈 장비, 첨단소재 업체입니다

기술현황 - Ion Beam Process

Deposition Technology

  • Ion Beam Sputtering Deposition

    The ion beam is aimed at a target to generate the sputtered material,which will constitute thin film to be deposited

    - Uniform and high productivity
    - Low temperature process
    - Simple process

  • Ion Beam Assisted Deposition

    Ion beam is aimed on the substrate to provide the ion assist, which supply a kinetic energy and greatly enhance the film properties

    Stoichiometry control of compound
    Dense thin film structure
    Minimize pin holes

Application

  • Flexible display

    Metal electrode layer
    TCO(Transparency conductive oxide)

  • Metal, Compound deposition

    Dental(Implant), Thin film solar cell, Semiconductor Architecture glass (IR, Thermal Absorption/Reflection)