"㈜인포비온"은

인류의 미래를 새롭게 창조해 나아갈 장비, 첨단소재 업체입니다

진공장비 - PVD

Ion Beam Treatment Sputter

Details

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  • Ion Beam Treatment Sputter system is designed for homogeneous film coating up to
    350 mm substrates. The system is extensively used for the deposition with a wide range
    of materials such as insulators, metals, and semiconductors.
    One or more magnetron cathodes of several sizes can be used in a system for multilayer
    depositio of each different material or co-deposition.

    Specification Linear anode ion source (attach the loadlock chamber)
    Uniformity : ≤ 3% (at 350mm zone)
    Base pressure :
    - Process Chamber ≤ 1 x 10-7 torr
    - Loadlock chamber ≤ 1 x 10-6 torr
    PEM (Plasma Monitoring System) : optional part
    Software interfaces : HMI programing base GUI software
    Application Metal & oxide films deposition
    Thin-film transistors
    Reserch & development
    Simply ion beam cleaning