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  • PVD
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      >PVD
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      >CVD
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      >OLED
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      >RTA
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  • Ion Beam Sputter System

"㈜인포비온"은

인류의 미래를 새롭게 창조해 나아갈 장비, 첨단소재 업체입니다

진공장비 - PVD

Ion Beam Sputter System

IBSD(Ion Beam Sputtering Deposition)은 이온빔을 타겟에 충돌시킴으로써 Sputtering되는 입자를 기판에 증착시키는 방법이다.
고품질의 박막 제조에 사용되는 방법으로 저온 공정이며 고진공에서 증착이 가능하므로 20%까지 박막내에 포집될수 있는 Ar가스의 박막 내부 오염을 배제할
수 있고, 이온빔 에너지와 이온빔 밀도의 독립적인 조절에 의한 우수한 재현성 및 신뢰성, 기판과 박막의 우수한 접착력의 특성을 띄게 된다.

Details

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  • IBS system is designed for homogeneous coating of 300 mm x 4 ea substrates, such as
    wafers.
    Typical applications of the system are multilayer films. Ion bombardment is possible to
    control film characteristics or pre-clean the substrate.
    IBS system is equipped with ion beam sputter source and assistant ion beam source.

    Specification Substrate diameter : 300mm x 4ea
    Ion beam source :
    - Sputter source : INFO 150G model
    - Assistant source : INFO 150G or INFO 250G
    Neutralizer : RF type neutralizer (filament-less type)
    Typical deposition rate : SiO2 3Å/min, Ta2Ox 4Å/min
    Uniformity : ≤ 1.5%
    Base pressure: ≤ 2 x 10-7 torr
    OMS (Optical Monitoring System) : optional part
    Software interfaces : HMI programing base GUI software
    Application - Magnetic material multilayer films deposition
    - Optical multilayers deposition
    - Dielectric and metal layer deposition
    - Simply ion beam cleaning