"㈜인포비온"은

인류의 미래를 새롭게 창조해 나아갈 장비, 첨단소재 업체입니다

진공장비 - PVD

Ion Beam Treatment Sputter

Detail

  • 카달로그 다운로드
  • Ion Beam Treatment Sputter system is designed for homogeneous coating of up to 350 mm substrates. The system is a versatile technique extensively used for the deposition of a wide range of materials such as insulators, metals, semiconductors. One or more magnetron cathodes of several sizes can be used in a system for deposition of multilayers of different materials or for co-deposition.

    Specification Linear anode ion source (attach the loadlock chamber)
    Uniformity : ≤ 3% (at 350mm zone)
    Base pressure :
    - Process Chamber ≤ 1 x 10-7 torr
    - Loadlock chamber ≤ 1 x 10-6 torr
    PEM (Plasma Monitoring System) : optional part
    Software interfaces : HMI programing base GUI software
    Application Metal & oxide films deposition
    Thin-film transistors
    Reserch & development
    Simply ion beam cleaning