"㈜인포비온"은

인류의 미래를 새롭게 창조해 나아갈 장비, 첨단소재 업체입니다

진공장비 - PVD

Combi IBD System

Detail

  • 카달로그 다운로드
  • Combinatorial system can be deposit binary or ternary composition are changed 0 to 100% in the thin film sample. It is possible to combinatorial deposition using by the moving mask shutter and fixed mask shutter module.

    Specification Deposition source :
    - RF ion beam source or magnetron sputter source (selectable)
    - RF ion beam source: INFO-60G
    - Magnetron sputter source : up to 6” cathode

    Combinatorial target quantity : max 3ea (co- sputter process)
    Moving mask shutter speed : max 11 mm/min
    Sample size : 2 ~ 6 inch
    Transfer chamber : auto transfer robot

    Base pressure :
    - Process chamber ≤ 1 x 10-7 torr
    - Transfer chamber ≤ 1 x 10-6 torr
    Software interfaces : HMI programing base GUI software

    Combinatorial Process Features
    - To prepare binary & ternary phase alloying at a high temp at one time
    - Rapid investigation to find ideal composition of numerous compounds
    - Excellent film uniformity on the 6” Wafer
    - Possible to change deposition modes (combinatorial & co-sputtering)
    - Atomically controlled layer-by-layer thin films